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[ subject:"Engineering, Materials Science." ]
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Diagnostic studies and modeling of i...
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University of California, Berkeley.
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Diagnostic studies and modeling of inductively coupled plasmas.
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Diagnostic studies and modeling of inductively coupled plasmas./
作者:
Hsu, Cheng-Che.
面頁冊數:
230 p.
附註:
Adviser: David B. Graves.
Contained By:
Dissertation Abstracts International68-02B.
標題:
Engineering, Materials Science. -
電子資源:
http://pqdd.sinica.edu.tw/twdaoeng/servlet/advanced?query=3253901
Diagnostic studies and modeling of inductively coupled plasmas.
Hsu, Cheng-Che.
Diagnostic studies and modeling of inductively coupled plasmas.
- 230 p.
Adviser: David B. Graves.
Thesis (Ph.D.)--University of California, Berkeley, 2006.
The focus of this dissertation is the study of plasma-surface interactions and plasma chemistries through experimental approaches and numerical simulation. Various diagnostic studies and modeling of inductively coupled plasmas are described.Subjects--Topical Terms:
1017759
Engineering, Materials Science.
Diagnostic studies and modeling of inductively coupled plasmas.
LDR
:03326nam 2200301 a 45
001
858159
005
20100712
008
100712s2006 ||||||||||||||||| ||eng d
035
$a
(UMI)AAI3253901
035
$a
AAI3253901
040
$a
UMI
$c
UMI
100
1
$a
Hsu, Cheng-Che.
$3
1025190
245
1 0
$a
Diagnostic studies and modeling of inductively coupled plasmas.
300
$a
230 p.
500
$a
Adviser: David B. Graves.
500
$a
Source: Dissertation Abstracts International, Volume: 68-02, Section: B, page: 1231.
502
$a
Thesis (Ph.D.)--University of California, Berkeley, 2006.
520
$a
The focus of this dissertation is the study of plasma-surface interactions and plasma chemistries through experimental approaches and numerical simulation. Various diagnostic studies and modeling of inductively coupled plasmas are described.
520
$a
Ruthenium etching with O2- and Cl2-containing ICP is studied. Ru etches readily in O2-containing plasmas. With Cl 2 addition, our observations include a significant increase in the etching rate, the detection of RuO4 at the downstream, the detection of RuOxCly ions in the plasma, and virtually zero wall deposition. Both O- and Cl-containing species (ions and/or neutrals) are necessary to explain the Cl2-addition effects.
520
$a
Diagnostic studies of Ar and octafluorocyclobutane plasmas are performed. The plasma species, the wall deposition rate, and the downstream species are quantified. Ar and F are the dominant radicals while CF+ and Ar+ appear to be the dominant ions. The detection of larger fluorocarbon ion species suggests the existence of larger fluorocarbon neutrals. The material balance shows over 30% of the incoming F- and C-containing species deposit on the chamber wall.
520
$a
Two OnWafer commercial plasma sensor systems are tested in the ICP system. Measurements of wafer temperature transients (using PlasmaTeMP(TM)) are compared to an energy transport model. Model predictions and measurements of transient wafer temperature profiles agree near-quantitatively, if details of the plasma heating sources and wafer characteristics are properly included. We outline a procedure to relate the temperature measurements to the surface ion flux profile. Measurements of the RF-current at the wafer surface (using PlasmaVolt(TM)) are shown to be approximately proportional to the square root of the electron density at the sheath edge.
520
$a
Comparisons of fluid model predictions with measurements in the ICP are reported. The model couples neutral flow, plasma, and electromagnetic equations. The gas chemistries used include Ar, Ar/O2, and Ar/O 2/Cl2. Measurements of electron density, EEPF, positive ion flux and its composition, and radical density at the wall are compared to corresponding model predictions. Radical and ion composition predictions are in good agreement for Ar and Ar/O2 plasmas, but the corresponding predictions in Ar/O2/Cl2 plasmas are in only partial agreement with measurements, implying that the chemical reaction database for this chemistry requires further work.
590
$a
School code: 0028.
650
4
$a
Engineering, Materials Science.
$3
1017759
690
$a
0794
710
2
$a
University of California, Berkeley.
$3
687832
773
0
$t
Dissertation Abstracts International
$g
68-02B.
790
$a
0028
790
1 0
$a
Graves, David B.,
$e
advisor
791
$a
Ph.D.
792
$a
2006
856
4 0
$u
http://pqdd.sinica.edu.tw/twdaoeng/servlet/advanced?query=3253901
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