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Engineering Novel Magnetic Insulator...

Channa, Sanyum,

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Engineering Novel Magnetic Insulators for Energy Efficient Devices /

Record Type:	Electronic resources : Monograph/item
Title/Author:	Engineering Novel Magnetic Insulators for Energy Efficient Devices // Sanyum Channa.
Author:	Channa, Sanyum,
Description:	1 electronic resource (262 pages)
Notes:	Source: Dissertations Abstracts International, Volume: 86-05, Section: B.
Contained By:	Dissertations Abstracts International86-05B.
Subject:	Interferometry. -
Online resource:	https://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=31643303
ISBN:	9798346389385

Engineering Novel Magnetic Insulators for Energy Efficient Devices /
Channa, Sanyum,

Engineering Novel Magnetic Insulators for Energy Efficient Devices /Sanyum Channa. - 1 electronic resource (262 pages)

Source: Dissertations Abstracts International, Volume: 86-05, Section: B.

This chapter covers several experimental techniques used to fabricate and characterize the films in this dissertation. Section 2.2 begins with an overview of the various thin film deposition techniques - pulsed laser deposition, sputtering and electron beam evaporation - used to grow the films and multilayers that form the basis of this thesis. Section 2.3 covers the fabrication techniques - photolithography, argon ion milling and oxygen plasma ashing - used to create complex micro-structures for studying various spin-based phenomena. Section 2.4 briefly describes all the physical characterization tools - atomic force microscopy, X-ray diffraction and reflectivity, and scanning transmission electron microscopy - used to quantify the crystalline quality and other relevant physical properties of our films. Section 2.5 delves into the techniques that help quantify both static and dynamic magnetic properties of our magnetic films, namely SQUID magnetometry and ferromagnetc resonance respectively. In this section, I also discuss X-ray absorption spectroscopy, a technique that allows for an element-specific study of a system's magnetization. Additionally, I discuss magnetic force microscopy, a cousin to atomic force microscopy, that provides a surface sensitive probe into the magnetic textures in a system. Finally, in Section 2.6, I briefly describe the various instrumentation that enable electrical transport measurements. The brief overview of techniques in this chapter forms a basis in understanding later results. More detailed background into each characterization technique will be introduced as needed in their respective chapters.2.2 Thin Film DepositionA variety of thin film deposition techniques have been developed to grow different types of materials since there is no single all-encompassing technique. In this section, we discuss 3 such techniques - sputtering, electron beam evaporation and pulsed laser deposition. Sputtering works very well for depositing high quality films of most metals and some dielectrics. Electron beam evaporation is well suited for depositing metals with high melting points since it significantly heats up the target surface. Pulsed laser deposition however does not work well for metals since they have a high surface reflectivity; conversely, insulators readily absorb the laser energy and ablate making this a great technique for the stoichiometric deposition of complex oxides.2.2.1 Pulsed Laser DepositionLAFO films were grown using pulsed laser deposition (PLD) in a home-built PLD chamber. PLD is an experimental technique used for the stoichiometric transfer of material from a solid source onto a substrate. This technique has been reported in literature as early as 1965, and since then has been used extensively for growing complex oxide films, interfaces, and heterostructures [1].A schematic of the PLD chamber is shown in Figure 2.1. A pressed ceramic target made of the material to be grown is attached onto a rotating target holder. The substrate is mounted onto a heater at the opposing end using silver paste. Afterwards, the chamber is pumped down to a base pressure of 10−7torr. To initiate the deposition, a KrF (248 nm) excimer laser (Coherent LPXpro) with 20 ns pulses ablates the target at a frequency of a few Hz as the target rotates. The laser pulse thermalizes the species at the target surface, launching them outwards in the form of a plasma plume towards the substrate.

English

ISBN: 9798346389385Subjects--Topical Terms:

620597
Interferometry.

Engineering Novel Magnetic Insulators for Energy Efficient Devices /
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245 1 0 $a Engineering Novel Magnetic Insulators for Energy Efficient Devices / $c Sanyum Channa.
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500 $a Advisors: Suzuki, Yuri Committee members: Feldman, Ben; Hwang, Harold; Bent, Stacey F.
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520 $a This chapter covers several experimental techniques used to fabricate and characterize the films in this dissertation. Section 2.2 begins with an overview of the various thin film deposition techniques - pulsed laser deposition, sputtering and electron beam evaporation - used to grow the films and multilayers that form the basis of this thesis. Section 2.3 covers the fabrication techniques - photolithography, argon ion milling and oxygen plasma ashing - used to create complex micro-structures for studying various spin-based phenomena. Section 2.4 briefly describes all the physical characterization tools - atomic force microscopy, X-ray diffraction and reflectivity, and scanning transmission electron microscopy - used to quantify the crystalline quality and other relevant physical properties of our films. Section 2.5 delves into the techniques that help quantify both static and dynamic magnetic properties of our magnetic films, namely SQUID magnetometry and ferromagnetc resonance respectively. In this section, I also discuss X-ray absorption spectroscopy, a technique that allows for an element-specific study of a system's magnetization. Additionally, I discuss magnetic force microscopy, a cousin to atomic force microscopy, that provides a surface sensitive probe into the magnetic textures in a system. Finally, in Section 2.6, I briefly describe the various instrumentation that enable electrical transport measurements. The brief overview of techniques in this chapter forms a basis in understanding later results. More detailed background into each characterization technique will be introduced as needed in their respective chapters.2.2 Thin Film DepositionA variety of thin film deposition techniques have been developed to grow different types of materials since there is no single all-encompassing technique. In this section, we discuss 3 such techniques - sputtering, electron beam evaporation and pulsed laser deposition. Sputtering works very well for depositing high quality films of most metals and some dielectrics. Electron beam evaporation is well suited for depositing metals with high melting points since it significantly heats up the target surface. Pulsed laser deposition however does not work well for metals since they have a high surface reflectivity; conversely, insulators readily absorb the laser energy and ablate making this a great technique for the stoichiometric deposition of complex oxides.2.2.1 Pulsed Laser DepositionLAFO films were grown using pulsed laser deposition (PLD) in a home-built PLD chamber. PLD is an experimental technique used for the stoichiometric transfer of material from a solid source onto a substrate. This technique has been reported in literature as early as 1965, and since then has been used extensively for growing complex oxide films, interfaces, and heterostructures [1].A schematic of the PLD chamber is shown in Figure 2.1. A pressed ceramic target made of the material to be grown is attached onto a rotating target holder. The substrate is mounted onto a heater at the opposing end using silver paste. Afterwards, the chamber is pumped down to a base pressure of 10−7torr. To initiate the deposition, a KrF (248 nm) excimer laser (Coherent LPXpro) with 20 ns pulses ablates the target at a frequency of a few Hz as the target rotates. The laser pulse thermalizes the species at the target surface, launching them outwards in the form of a plasma plume towards the substrate.
546 $a English
590 $a School code: 0212
650 4 $a Interferometry. $3 620597
650 4 $a Spectrum analysis. $3 520440
650 4 $a Electromagnetism. $3 522050
650 4 $a Microscopy. $3 540544
650 4 $a Anisotropy. $3 596747
650 4 $a Engineering. $3 586835
650 4 $a Magnetism. $3 524508
650 4 $a Energy consumption. $3 631630
650 4 $a Thin films. $3 626403
650 4 $a Lithium. $3 1638490
650 4 $a Analytical chemistry. $3 3168300
650 4 $a Condensed matter physics. $3 3173567
650 4 $a Electromagnetics. $3 3173223
650 4 $a Energy. $3 876794
650 4 $a Materials science. $3 543314
650 4 $a Optics. $3 517925
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710 2 $a Stanford University. $e degree granting institution. $3 3765820
720 1 $a Suzuki, Yuri $e degree supervisor.
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791 $a Ph.D.
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