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Combined Process and Device Simulati...
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Mengjie, Li,
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Combined Process and Device Simulation as a Means to Support BBr3 Tube Furnace Diffusion Process Optimization for Industrial High˗Efficiency N˗Type Crystalline Silicon Solar Cells /
Record Type:
Electronic resources : Monograph/item
Title/Author:
Combined Process and Device Simulation as a Means to Support BBr3 Tube Furnace Diffusion Process Optimization for Industrial High˗Efficiency N˗Type Crystalline Silicon Solar Cells // Li Mengjie.
Author:
Mengjie, Li,
Description:
1 electronic resource (171 pages)
Notes:
Source: Dissertations Abstracts International, Volume: 83-05, Section: B.
Contained By:
Dissertations Abstracts International83-05B.
Subject:
Boron. -
Online resource:
https://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=28828356
ISBN:
9798460439362
Combined Process and Device Simulation as a Means to Support BBr3 Tube Furnace Diffusion Process Optimization for Industrial High˗Efficiency N˗Type Crystalline Silicon Solar Cells /
Mengjie, Li,
Combined Process and Device Simulation as a Means to Support BBr3 Tube Furnace Diffusion Process Optimization for Industrial High˗Efficiency N˗Type Crystalline Silicon Solar Cells /
Li Mengjie. - 1 electronic resource (171 pages)
Source: Dissertations Abstracts International, Volume: 83-05, Section: B.
This thesis focuses on the development of a predictive simulation framework which supports process optimization for BBr3 diffusion and improves the efficiency of silicon solar cells. Five main topics are investigated: a. A Sentaurus TCAD process simulation program is developed and calibrated by experiments. b. The passivation of heavily diffused p+ silicon surfaces is characterized. c. A systematic method to quantify the metallization-induced recombination losses on heavily diffused p+ silicon surfaces is developed, which involves intensity-dependent photoluminescence imaging and image processing with Griddler-AI. d. The experimentally observed microscopic metal-Si interface is studied by 2D unit-cell simulations. e. Combining the developed process and device simulations, cell efficiency improvements due to processing changes are quantified as a function of the process parameters. Experimentally, the efficiency of n-type bifacial front and back contacted silicon solar cells with screen-printed contacts is improved from 18.9 ± 0.5% to 20.8 ± 0.5%.
English
ISBN: 9798460439362Subjects--Topical Terms:
544039
Boron.
Subjects--Index Terms:
Process optimization
Combined Process and Device Simulation as a Means to Support BBr3 Tube Furnace Diffusion Process Optimization for Industrial High˗Efficiency N˗Type Crystalline Silicon Solar Cells /
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This thesis focuses on the development of a predictive simulation framework which supports process optimization for BBr3 diffusion and improves the efficiency of silicon solar cells. Five main topics are investigated: a. A Sentaurus TCAD process simulation program is developed and calibrated by experiments. b. The passivation of heavily diffused p+ silicon surfaces is characterized. c. A systematic method to quantify the metallization-induced recombination losses on heavily diffused p+ silicon surfaces is developed, which involves intensity-dependent photoluminescence imaging and image processing with Griddler-AI. d. The experimentally observed microscopic metal-Si interface is studied by 2D unit-cell simulations. e. Combining the developed process and device simulations, cell efficiency improvements due to processing changes are quantified as a function of the process parameters. Experimentally, the efficiency of n-type bifacial front and back contacted silicon solar cells with screen-printed contacts is improved from 18.9 ± 0.5% to 20.8 ± 0.5%.
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https://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=28828356
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