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Handbook of plasma processing techno...

Rossnagel, Stephen M.

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Handbook of plasma processing technology : = fundamentals, etching, deposition, and surface interactions /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Handbook of plasma processing technology :/ edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Reminder of title:	fundamentals, etching, deposition, and surface interactions /
other author:	Rossnagel, Stephen M.
Published:	Park Ridge, N.J., U.S.A. :Noyes Publications, : c1990.,
Description:	xxiii, 523 p. :ill. ;25 cm
Series:	Materials science and process technology series
Subject:	Plasma engineering. -
Online resource:	http://www.loc.gov/catdir/description/wap041/89022834.html
ISBN:	0815512201 :

Handbook of plasma processing technology : = fundamentals, etching, deposition, and surface interactions /
Handbook of plasma processing technology :fundamentals, etching, deposition, and surface interactions /edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. - Park Ridge, N.J., U.S.A. :Noyes Publications,c1990. - xxiii, 523 p. :ill. ;25 cm - Materials science and process technology series.

Includes bibliographical references.

ISBN: 0815512201 :$86.00

LCCN: 89022834 Subjects--Topical Terms:

674159
Plasma engineering.

LC Class. No.: TA2020 / .H37 1990

Dewey Class. No.: 621.044

Handbook of plasma processing technology : = fundamentals, etching, deposition, and surface interactions /
LDR:01000cam 2200265 a 4500 001 2424919
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008 260612s1990 njua b 001 0 eng
010 $a 89022834
020 $a 0815512201 : $c $86.00
020 $a 9780815512202
035 $a 1508706
035 $9 (DLC) 89022834
035 $a 1508706
040 $a DLC $c DLC $d DLC
050 0 0 $a TA2020 $b .H37 1990
082 0 0 $a 621.044 $2 19
245 0 0 $a Handbook of plasma processing technology : $b fundamentals, etching, deposition, and surface interactions / $c edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
260 # $a Park Ridge, N.J., U.S.A. : $b Noyes Publications, $c c1990.
300 $a xxiii, 523 p. : $b ill. ; $c 25 cm
336 $a text $b txt $2 rdacontent
337 $a unmediated $b n $2 rdamedia
338 $a volume $b nc $2 rdacarrier
440 0 $a Materials science and process technology series
504 $a Includes bibliographical references.
650 # 0 $a Plasma engineering. $3 674159
650 # 0 $a Semiconductors $x Etching. $3 837117
650 # 0 $a Plasma etching. $3 712111
700 1 # $a Rossnagel, Stephen M. $3 1639724
700 1 # $a Cuomo, J. J. $3 3808585
700 1 # $a Westwood, William D. $q (William Dickson), $d 1937- $3 3808586
856 4 2 $3 Publisher description $u http://www.loc.gov/catdir/description/wap041/89022834.html