| Record Type: |
Electronic resources
: Monograph/item
|
| Title/Author: |
Photoresist technology in microsystems/ by Kaiying Wang. |
| Reminder of title: |
principles, processes and applications / |
| Author: |
Wang, Kaiying. |
| Published: |
Singapore :Springer Nature Singapore : : 2025., |
| Description: |
xii, 183 p. :ill., digital ;24 cm. |
| [NT 15003449]: |
1. Introduction to Photoresist Technology -- 2. Fundamentals of Photoresist Chemistry -- 3. Microsystems Fabrication Processes -- 4. Advanced Photoresist Materials for Microsystems -- 5. Photoresist Processing Techniques -- 6. Photoresist Applications in Microsystems -- 7. High-Aspect-Ratio Lithography for Microsystems -- 8. Challenges in Photoresist Technology for Microsystems -- 9. Emerging Trends in Photoresist Technology -- 10. Future Perspectives. |
| Contained By: |
Springer Nature eBook |
| Subject: |
Photoresists. - |
| Online resource: |
https://doi.org/10.1007/978-981-95-1606-3 |
| ISBN: |
9789819516063 |