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Estimating and Controlling Droplet D...

Zadgaonkar, Aditya A.

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Estimating and Controlling Droplet Displacement Induced by Local Plasma Force.

Record Type:	Electronic resources : Monograph/item
Title/Author:	Estimating and Controlling Droplet Displacement Induced by Local Plasma Force./
Author:	Zadgaonkar, Aditya A.
Published:	Ann Arbor : ProQuest Dissertations & Theses, : 2020,
Description:	59 p.
Notes:	Source: Masters Abstracts International, Volume: 82-02.
Contained By:	Masters Abstracts International82-02.
Subject:	Mechanical engineering. -
Online resource:	https://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=27995854
ISBN:	9798662451988

Estimating and Controlling Droplet Displacement Induced by Local Plasma Force.
Zadgaonkar, Aditya A.

Estimating and Controlling Droplet Displacement Induced by Local Plasma Force. - Ann Arbor : ProQuest Dissertations & Theses, 2020 - 59 p.

Source: Masters Abstracts International, Volume: 82-02.

Thesis (M.S.)--University of California, San Diego, 2020.

This item must not be sold to any third party vendors.

ASML is the global leader in photolithography equipment. With advent of EUV Lithography technology, it is possible to create microchips with smaller transistors and with greater precision. As EUV Lithography technology matures, customers expect ever higher productivity from these machines. This thesis analyzes a phenomenon called Local Force, which can negatively affect the system's productivity. Additionally, this thesis proposes a method to correct for the disturbances caused by the Local Force. A set of four experiments are proposed to characterize the nature of the Local Force. These experiments demonstrate linear relation between the amount of EUV produced and the droplet displacement and impact on the upstream droplets. Additionally the experiments identify a process window in which the droplet displacement would not affect system performance. These findings were then used to a develop Kalman predictor and a feedforward algorithm which can compensate for the disturbances produced by the Local Force. Using data from a real machine in conjunction with a high fidelity simulation, it is shown that the algorithm can maintain the L2Dx position within the process window.

ISBN: 9798662451988Subjects--Topical Terms:

649730
Mechanical engineering.
Subjects--Index Terms:

EUV Lithography technology

Estimating and Controlling Droplet Displacement Induced by Local Plasma Force.
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245 1 0 $a Estimating and Controlling Droplet Displacement Induced by Local Plasma Force.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 2020
300 $a 59 p.
500 $a Source: Masters Abstracts International, Volume: 82-02.
500 $a Advisor: Bitmead, Robert.
502 $a Thesis (M.S.)--University of California, San Diego, 2020.
506 $a This item must not be sold to any third party vendors.
520 $a ASML is the global leader in photolithography equipment. With advent of EUV Lithography technology, it is possible to create microchips with smaller transistors and with greater precision. As EUV Lithography technology matures, customers expect ever higher productivity from these machines. This thesis analyzes a phenomenon called Local Force, which can negatively affect the system's productivity. Additionally, this thesis proposes a method to correct for the disturbances caused by the Local Force. A set of four experiments are proposed to characterize the nature of the Local Force. These experiments demonstrate linear relation between the amount of EUV produced and the droplet displacement and impact on the upstream droplets. Additionally the experiments identify a process window in which the droplet displacement would not affect system performance. These findings were then used to a develop Kalman predictor and a feedforward algorithm which can compensate for the disturbances produced by the Local Force. Using data from a real machine in conjunction with a high fidelity simulation, it is shown that the algorithm can maintain the L2Dx position within the process window.
590 $a School code: 0033.
650 4 $a Mechanical engineering. $3 649730
650 4 $a Optics. $3 517925
650 4 $a Chemical engineering. $3 560457
653 $a EUV Lithography technology
653 $a Local Force
653 $a Droplet displacement
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710 2 $a University of California, San Diego. $b Mechanical and Aerospace Engineering. $3 2096513
773 0 $t Masters Abstracts International $g 82-02.
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