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Materials and processes for next gen...

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Robinson, Alex,

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Materials and processes for next generation lithography

Record Type:	Electronic resources : Monograph/item
Title/Author:	Materials and processes for next generation lithography/ edited by Alex Robinson, Richard Lawson.
other author:	Robinson, Alex,
Published:	Amsterdam, Netherlands :Elsevier, : 2016.,
Description:	1 online resource
Subject:	Microlithography. -
Online resource:	http://www.sciencedirect.com/science/book/9780081003541
ISBN:	9780081003541

Materials and processes for next generation lithography
Materials and processes for next generation lithography[electronic resource] /edited by Alex Robinson, Richard Lawson. - Amsterdam, Netherlands :Elsevier,2016. - 1 online resource

ISBN: 9780081003541Subjects--Topical Terms:

890853
Microlithography.
Index Terms--Genre/Form:

542853
Electronic books.

LC Class. No.: TK7872.M3

Dewey Class. No.: 621.38153

Materials and processes for next generation lithography
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005 20170430142706.0
006 m o d
007 cr cn|||||||||
008 171229s2016 ne o 000 0 eng d
020 $a 9780081003541 $q (electronic bk.)
020 $a 0081003544 $q (electronic bk.)
020 $a 9780081003589 $q (electronic bk.)
020 $a 0081003587 $q (electronic bk.)
035 $a (OCoLC)ocn962823082
035 $a els17002029
040 $a YDX $b eng $c YDX $d NLE $d OCLCO $d UIU $d IDEBK $d UIU $d OPELS $d EBLCP
041 0 $a eng
050 4 $a TK7872.M3
082 0 4 $a 621.38153 $2 23
245 0 0 $a Materials and processes for next generation lithography $h [electronic resource] / $c edited by Alex Robinson, Richard Lawson.
260 $a Amsterdam, Netherlands : $b Elsevier, $c 2016.
300 $a 1 online resource
650 0 $a Microlithography. $3 890853
650 0 $a Photoresists. $3 2179865
655 4 $a Electronic books. $2 lcsh $3 542853
700 1 $a Robinson, Alex, $e editor. $3 3235543
700 1 $a Lawson, Richard, $e editor. $3 3235544
856 4 0 $u http://www.sciencedirect.com/science/book/9780081003541

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EB TK7872.M3

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