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Design for manufacturability with ad...

Yu, Bei.

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Design for manufacturability with advanced lithography

Record Type:	Electronic resources : Monograph/item
Title/Author:	Design for manufacturability with advanced lithography/ by Bei Yu, David Z. Pan.
Author:	Yu, Bei.
other author:	Pan, David Z.
Published:	Cham :Springer International Publishing : : 2016.,
Description:	xi, 164 p. :ill., digital ;24 cm.
[NT 15003449]:	Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.
Contained By:	Springer eBooks
Subject:	Integrated circuits - Design and construction. -
Online resource:	http://dx.doi.org/10.1007/978-3-319-20385-0
ISBN:	9783319203850$q(electronic bk.)

Design for manufacturability with advanced lithography
Yu, Bei.

Design for manufacturability with advanced lithography[electronic resource] /by Bei Yu, David Z. Pan. - Cham :Springer International Publishing :2016. - xi, 164 p. :ill., digital ;24 cm.

Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

ISBN: 9783319203850$q(electronic bk.)

Standard No.: 10.1007/978-3-319-20385-0doiSubjects--Topical Terms:

658490
Integrated circuits
--Design and construction.

LC Class. No.: TK7874

Dewey Class. No.: 621.3815

Design for manufacturability with advanced lithography
LDR:02115nmm a2200313 a 4500 001 2029072
003 DE-He213
005 20160720151517.0
006 m d
007 cr nn 008maaau
008 160908s2016 gw s 0 eng d
020 $a 9783319203850$q(electronic bk.)
020 $a 9783319203843$q(paper)
024 7 $a 10.1007/978-3-319-20385-0 $2 doi
035 $a 978-3-319-20385-0
040 $a GP $c GP
041 0 $a eng
050 4 $a TK7874
072 7 $a TJFC $2 bicssc
072 7 $a TEC008010 $2 bisacsh
082 0 4 $a 621.3815 $2 23
090 $a TK7874 $b .Y94 2016
100 1 $a Yu, Bei. $3 1923776
245 1 0 $a Design for manufacturability with advanced lithography $h [electronic resource] / $c by Bei Yu, David Z. Pan.
260 $a Cham : $b Springer International Publishing : $b Imprint: Springer, $c 2016.
300 $a xi, 164 p. : $b ill., digital ; $c 24 cm.
505 0 $a Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.
520 $a This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
650 0 $a Integrated circuits $x Design and construction. $3 658490
650 0 $a Photoresists. $3 2179865
650 0 $a Lithography. $3 763743
650 1 4 $a Engineering. $3 586835
650 2 4 $a Circuits and Systems. $3 896527
650 2 4 $a Processor Architectures. $3 892680
650 2 4 $a Electronics and Microelectronics, Instrumentation. $3 893838
700 1 $a Pan, David Z. $3 2179864
710 2 $a SpringerLink (Online service) $3 836513
773 0 $t Springer eBooks
856 4 0 $u http://dx.doi.org/10.1007/978-3-319-20385-0
950 $a Engineering (Springer-11647)