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氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = = Charact...

王乾坤

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氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = = Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = / 王乾坤撰
Reminder of title:	Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System /
remainder title:	Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System
Author:	王乾坤
other author:	王智明
Published:	[花蓮縣壽豐鄉] : [國立東華大學光電工程學系], : 民102年[2013],
Description:	11,79面 : 圖,表 ; 30公分
Notes:	畢業學年度:101
Online resource:	http://134.208.29.93/cgi-bin/cdrfb3/gsweb.cgi?o=dstdcdr&i=ssid=%22610025020%22.PDF全文

氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = = Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System /
王乾坤

氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System / Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System王乾坤撰 - 初版 - [花蓮縣壽豐鄉] : [國立東華大學光電工程學系], 民102年[2013] - 11,79面 : 圖,表 ; 30公分

畢業學年度:101

碩士論文-- 國立東華大學光電工程學系

參考書目：面77-79

贈閱Subjects--Index Terms:

低氮化合物

氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = = Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System /
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035 $a 1886010
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100 1 $a 王乾坤 $e 撰 $3 2818101
245 1 0 $a 氫氣與氮氣在分子束磊晶系統射頻電漿源的光譜特性 = $b Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System / $c 王乾坤撰
246 1 1 $a Characterization of Optical Emission Spectrum of Hydrogen and Nitrogen in RF Plasma Source for MBE System
250 $a 初版
260 $a [花蓮縣壽豐鄉] : $b [國立東華大學光電工程學系], $c 民102年[2013]
300 $a 11,79面 : $b 圖,表 ; $c 30公分
500 $a 畢業學年度:101
500 $a 指導教授：王智明、祁錦雲
502 $a 碩士論文-- 國立東華大學光電工程學系
504 $a 參考書目：面77-79
504 $a 含附錄
563 $a 贈閱
653 0 $a 低氮化合物
653 0 $a 氫原子輔助
653 0 $a 分子束磊晶
653 0 $a 射頻電漿源
653 0 $a dilute nitride
653 0 $a hydrogen-assisted
653 0 $a molecular beam epitaxy
653 0 $a RF plasma source
700 1 $a 王智明 $e 指導教授 $3 2928761
700 1 $a 祁錦雲 $e 共同指導 $3 3072767
700 1 $a Wang, Chian-Kuen $3 3072768
700 1 $a Wang, Chih-Ming $3 3036284
700 1 $a Chi, Jim-Yong $3 3036312
856 4 $u http://134.208.29.93/cgi-bin/cdrfb3/gsweb.cgi?o=dstdcdr&i=ssid=%22610025020%22. $z PDF全文 $2 http