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Microplasmas and microdischarges for...

Wilson, Chester Goodwin.

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Microplasmas and microdischarges for manufacturing and sensing applications.

Record Type:	Electronic resources : Monograph/item
Title/Author:	Microplasmas and microdischarges for manufacturing and sensing applications./
Author:	Wilson, Chester Goodwin.
Description:	162 p.
Notes:	Source: Dissertation Abstracts International, Volume: 64-05, Section: B, page: 2332.
Contained By:	Dissertation Abstracts International64-05B.
Subject:	Engineering, Electronics and Electrical. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3089702
ISBN:	0496374346

Microplasmas and microdischarges for manufacturing and sensing applications.
Wilson, Chester Goodwin.

Microplasmas and microdischarges for manufacturing and sensing applications. - 162 p.

Source: Dissertation Abstracts International, Volume: 64-05, Section: B, page: 2332.

Thesis (Ph.D.)--The University of Wisconsin - Madison, 2003.

This thesis concerns the scaling down of plasmas in size by reducing the electrode spacing, and increasing the operating pressure. The results are referred to as "microplasmas" for electric discharges generated in the 1--20 Torr range and as "microdischarges" in the 100 Torr-atmosphere range. Microdischarges and microplasmas are species with their own characteristic physical properties.

ISBN: 0496374346Subjects--Topical Terms:

626636
Engineering, Electronics and Electrical.

Microplasmas and microdischarges for manufacturing and sensing applications.
LDR:03257nmm 2200313 4500 001 1850850
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020 $a 0496374346
035 $a (UnM)AAI3089702
035 $a AAI3089702
040 $a UnM $c UnM
100 1 $a Wilson, Chester Goodwin. $3 1938758
245 1 0 $a Microplasmas and microdischarges for manufacturing and sensing applications.
300 $a 162 p.
500 $a Source: Dissertation Abstracts International, Volume: 64-05, Section: B, page: 2332.
500 $a Supervisor: Yogesh B. Gianchandani.
502 $a Thesis (Ph.D.)--The University of Wisconsin - Madison, 2003.
520 $a This thesis concerns the scaling down of plasmas in size by reducing the electrode spacing, and increasing the operating pressure. The results are referred to as "microplasmas" for electric discharges generated in the 1--20 Torr range and as "microdischarges" in the 100 Torr-atmosphere range. Microdischarges and microplasmas are species with their own characteristic physical properties.
520 $a Experiments show how microscale DC plasmas differ considerably in breakdown and generation parameters from macroscale plasmas. Most of the glow in microplasmas is confined directly over the cathode, which is a result of field driven cathode emission electrons producing the bulk of the ionization. This glow region supports a strong voltage gradient, in contrast to traditional plasmas.
520 $a This effort has also demonstrated the use of microplasmas for the etching of silicon. The microplasmas are generated by DC voltage applied to in-situ electrodes patterned on the silicon wafer that also served as an etch mask and a shield against the applied potential. Short etches at rates exceeding 17 mum/min. and sustained etch rates in the range of 4--10 mum/min. are demonstrated, and through-wafer etches are achieved using SF6. Typical operating pressures and power densities are in the range of 1--20 Torr and 1--10 W/cm2, respectively. Varying degrees of anisotropy are achieved by changing the etch conditions. The etch rate depends linearly on the electrode power density. Miniaturized magnetics are shown to modify the properties of microplasmas. The configurations have been seen to increase plasma current, and increase plasma densities.
520 $a A MEMS device utilizing microdischarges---LEd-SpEC---a l&barbelow;iquid e&barbelow;lectrod&barbelow;e s&barbelow;p&barbelow;ectral e&barbelow;mission c&barbelow;hip device is shown to detect sodium impurities of concentration less than 10 ppm, lead impurities at 5 ppm, and aluminum and chrome impurities of 10 ppm. The device operates at atmosphere by sputtering the cathode, which is the liquid sample under test. Metal impurities are then detected by spectroscopy of the microdischarge glow. Impurity concentration is calibrated by impurity/N2 spectral ratios. The device shows promise as a possible on chip optical source ranging to ultraviolet wavelengths.
590 $a School code: 0262.
650 4 $a Engineering, Electronics and Electrical. $3 626636
650 4 $a Physics, Fluid and Plasma. $3 1018402
690 $a 0544
690 $a 0759
710 2 0 $a The University of Wisconsin - Madison. $3 626640
773 0 $t Dissertation Abstracts International $g 64-05B.
790 1 0 $a Gianchandani, Yogesh B., $e advisor
790 $a 0262
791 $a Ph.D.
792 $a 2003
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3089702