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Optical low coherence reflectometry ...

Shelley, Paul H. Jr.

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Optical low coherence reflectometry for process analysis.

Record Type:	Electronic resources : Monograph/item
Title/Author:	Optical low coherence reflectometry for process analysis./
Author:	Shelley, Paul H. Jr.
Description:	205 p.
Notes:	Source: Dissertation Abstracts International, Volume: 57-12, Section: B, page: 7497.
Contained By:	Dissertation Abstracts International57-12B.
Subject:	Chemistry, Analytical. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9716920
ISBN:	0591248611

Optical low coherence reflectometry for process analysis.
Shelley, Paul H. Jr.

Optical low coherence reflectometry for process analysis. - 205 p.

Source: Dissertation Abstracts International, Volume: 57-12, Section: B, page: 7497.

Thesis (Ph.D.)--University of Washington, 1996.

This work begins with a presentation of the theory of optical low coherence reflectometry (OLCR) including a summary of previous research in this field. Characterization of an OLCR instrument and its use in the measurement of single layer polymer films is addressed. In addition, the use of OLCR for measurements of process applications of transparent materials including: biological film thickness measurement, layer thickness in multiple layer films, and clear coat layer thickness, is discussed. Considerations of light scattering theory are explored with an emphasis on the phenomenon of enhanced backscattering especially with respect to three different model scattering systems. The final area of research describes two process applications of OLCR measurement for light scattering materials with a focus on particle size analysis in attrition milling processes.

ISBN: 0591248611Subjects--Topical Terms:

586156
Chemistry, Analytical.

Optical low coherence reflectometry for process analysis.
LDR:01765nmm 2200289 4500 001 1837849
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008 130614s1996 eng d
020 $a 0591248611
035 $a (UnM)AAI9716920
035 $a AAI9716920
040 $a UnM $c UnM
100 1 $a Shelley, Paul H. Jr. $3 1926279
245 1 0 $a Optical low coherence reflectometry for process analysis.
300 $a 205 p.
500 $a Source: Dissertation Abstracts International, Volume: 57-12, Section: B, page: 7497.
500 $a Chairperson: Bruce R. Kowalski.
502 $a Thesis (Ph.D.)--University of Washington, 1996.
520 $a This work begins with a presentation of the theory of optical low coherence reflectometry (OLCR) including a summary of previous research in this field. Characterization of an OLCR instrument and its use in the measurement of single layer polymer films is addressed. In addition, the use of OLCR for measurements of process applications of transparent materials including: biological film thickness measurement, layer thickness in multiple layer films, and clear coat layer thickness, is discussed. Considerations of light scattering theory are explored with an emphasis on the phenomenon of enhanced backscattering especially with respect to three different model scattering systems. The final area of research describes two process applications of OLCR measurement for light scattering materials with a focus on particle size analysis in attrition milling processes.
590 $a School code: 0250.
650 4 $a Chemistry, Analytical. $3 586156
650 4 $a Engineering, Materials Science. $3 1017759
650 4 $a Physics, Optics. $3 1018756
690 $a 0486
690 $a 0794
690 $a 0752
710 2 0 $a University of Washington. $3 545923
773 0 $t Dissertation Abstracts International $g 57-12B.
790 1 0 $a Kowalski, Bruce R., $e advisor
790 $a 0250
791 $a Ph.D.
792 $a 1996
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9716920