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Reactive gases in glow discharge ion...
~
Hastings, Elizabeth Pierz.
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Reactive gases in glow discharge ion sources: Sputtering and ionization considerations.
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Reactive gases in glow discharge ion sources: Sputtering and ionization considerations./
作者:
Hastings, Elizabeth Pierz.
面頁冊數:
151 p.
附註:
Source: Dissertation Abstracts International, Volume: 65-08, Section: B, page: 3996.
Contained By:
Dissertation Abstracts International65-08B.
標題:
Chemistry, Analytical. -
電子資源:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3144196
ISBN:
9780496022687
Reactive gases in glow discharge ion sources: Sputtering and ionization considerations.
Hastings, Elizabeth Pierz.
Reactive gases in glow discharge ion sources: Sputtering and ionization considerations.
- 151 p.
Source: Dissertation Abstracts International, Volume: 65-08, Section: B, page: 3996.
Thesis (Ph.D.)--University of Florida, 2004.
Glow discharge (GD) spectrometry is an established technique for the analysis of solid samples. The glow discharge source is simple yet versatile, providing information for both emission and mass spectrometry methods. A GD source shows stable operation in both direct current (dc) mode and pulsed mode, providing either a continuous supply of photons, atoms, and ions or a time-variant beam. Advantages accrue to both types of operation.
ISBN: 9780496022687Subjects--Topical Terms:
586156
Chemistry, Analytical.
Reactive gases in glow discharge ion sources: Sputtering and ionization considerations.
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Source: Dissertation Abstracts International, Volume: 65-08, Section: B, page: 3996.
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Glow discharge (GD) spectrometry is an established technique for the analysis of solid samples. The glow discharge source is simple yet versatile, providing information for both emission and mass spectrometry methods. A GD source shows stable operation in both direct current (dc) mode and pulsed mode, providing either a continuous supply of photons, atoms, and ions or a time-variant beam. Advantages accrue to both types of operation.
520
$a
A glow discharge source commonly uses argon as the discharge gas due to its inert nature, discharge stability, and relatively simple spectra. Other noble gases have also been studied: helium, neon, krypton, and xenon; all sustain a workable GD plasma. The plasma gas employed in a glow discharge will have a significant effect on the type of ions produced. In analytical GD spectrometry, only high purity non-reactive gases are normally used in the discharge. However, oxygen, nitrogen, and water vapor are common impurities from trace leaks in the source or vacuum system. Mixed gas plasmas, primarily the addition of small percentage increments of a reactive gas to a noble gas base discharge, have been explored for glow discharge---optical emission spectrometry (GD-OES). Limited information is available on reactive gases using glow discharge mass spectrometry.
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In this work we are interested in the performance of a glow discharge as traditional, inert gases are systematically replaced by alternative reactive gases. Our main focus is to monitor the effect that type and composition of discharge gas have on the positive ion population. By varying the gas composition, there is also the possibility of controlling the reagent ion population for chemical ionization. A Grimm-type microsecond pulsed glow discharge time-of-flight mass analyzer was used.
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$a
To monitor how oxygen, nitrogen, or methane affect a normal argon discharge, the following studies were conducted: (1) comparison of argon versus mixed-gas discharge environments, (2) comparison of pulsed versus direct current discharges, (3) determination of ions of the gas species present in the discharge, and (4) comparison of the sputtering rates. Additionally, reactive versus potentially non-reactive cathodes were employed to further study the ionization and sputtering effects of unconventional gases. To decouple the reactive plasma from potentially reactive surface processes, gold was employed as a relatively non-reactive cathode material. For comparison, NIST SRM 1113, a copper-based standard, was used as a reactive cathode surface.
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