Language:
English
繁體中文
Help
回圖書館首頁
手機版館藏查詢
Login
Back
Switch To:
Labeled
|
MARC Mode
|
ISBD
Variation and Defect Tolerance for N...
~
Tunc, Cihan.
Linked to FindBook
Google Book
Amazon
博客來
Variation and Defect Tolerance for Nano Crossbars.
Record Type:
Language materials, printed : Monograph/item
Title/Author:
Variation and Defect Tolerance for Nano Crossbars./
Author:
Tunc, Cihan.
Description:
66 p.
Notes:
Source: Masters Abstracts International, Volume: 49-04, page: .
Contained By:
Masters Abstracts International49-04.
Subject:
Engineering, Computer. -
Online resource:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=1489297
ISBN:
9781124497334
Variation and Defect Tolerance for Nano Crossbars.
Tunc, Cihan.
Variation and Defect Tolerance for Nano Crossbars.
- 66 p.
Source: Masters Abstracts International, Volume: 49-04, page: .
Thesis (M.S.)--Northeastern University, 2010.
With the extreme shrinking in CMOS technology, quantum effects and manufacturing issues are getting more crucial. Hence, additional shrinking in CMOS feature size seems becoming more challenging, difficult, and costly. On the other hand, emerging nanotechnology has attracted many researchers since additional scaling down has been demonstrated by manufacturing nanowires, Carbon nanotubes as well as molecular switches using bottom-up manufacturing techniques. In addition to the progress in manufacturing, developments in architecture show that emerging nanoelectronic devices will be promising for the future system designs. Using nano crossbars, which are composed of two sets of perpendicular nanowires with programmable intersections, it is possible to implement logic functions. In addition, nano crossbars present some important features as regularity, reprogrammability, and interchangeability. Combining these features, researchers have presented different effective architectures.
ISBN: 9781124497334Subjects--Topical Terms:
1669061
Engineering, Computer.
Variation and Defect Tolerance for Nano Crossbars.
LDR
:03372nam 2200325 4500
001
1396060
005
20110527105500.5
008
130515s2010 ||||||||||||||||| ||eng d
020
$a
9781124497334
035
$a
(UMI)AAI1489297
035
$a
AAI1489297
040
$a
UMI
$c
UMI
100
1
$a
Tunc, Cihan.
$3
1674819
245
1 0
$a
Variation and Defect Tolerance for Nano Crossbars.
300
$a
66 p.
500
$a
Source: Masters Abstracts International, Volume: 49-04, page: .
500
$a
Adviser: Mehdi Baradaran Tahoori.
502
$a
Thesis (M.S.)--Northeastern University, 2010.
520
$a
With the extreme shrinking in CMOS technology, quantum effects and manufacturing issues are getting more crucial. Hence, additional shrinking in CMOS feature size seems becoming more challenging, difficult, and costly. On the other hand, emerging nanotechnology has attracted many researchers since additional scaling down has been demonstrated by manufacturing nanowires, Carbon nanotubes as well as molecular switches using bottom-up manufacturing techniques. In addition to the progress in manufacturing, developments in architecture show that emerging nanoelectronic devices will be promising for the future system designs. Using nano crossbars, which are composed of two sets of perpendicular nanowires with programmable intersections, it is possible to implement logic functions. In addition, nano crossbars present some important features as regularity, reprogrammability, and interchangeability. Combining these features, researchers have presented different effective architectures.
520
$a
Although bottom-up nanofabrication can greatly reduce manufacturing costs, due to low controllability in the manufacturing process, some critical issues occur. Bottom- up nanofabrication process results in high variation compared to conventional top- down lithography used in CMOS technology. In addition, an increased failure rate is expected. Variation and defect tolerance methods used for conventional CMOS technology seem inadequate for adapting to emerging nano technology because the variation and the defect rate for emerging nano technology is much more than current CMOS technology. Therefore, variations and defect tolerance methods for emerging nano technology are necessary for a successful transition.
520
$a
In this work, in order to tolerate variations for crossbars, we introduce a framework that is established based on reprogrammability and interchangeability features of nano crossbars. This framework is shown to be applicable for both FET-based and diode-based nano crossbars. We present a characterization testing method which requires minimal number of test vectors. We formulate the variation optimization problem using Simulated Annealing with different optimization goals. Furthermore, we extend the framework for defect tolerance. Experimental results and comparison of proposed framework with exhaustive methods confirm its effectiveness for both variation and defect tolerance.
590
$a
School code: 0160.
650
4
$a
Engineering, Computer.
$3
1669061
650
4
$a
Nanotechnology.
$3
526235
690
$a
0464
690
$a
0652
710
2
$a
Northeastern University.
$b
Electrical and Computer Engineering.
$3
1018491
773
0
$t
Masters Abstracts International
$g
49-04.
790
1 0
$a
Tahoori, Mehdi Baradaran,
$e
advisor
790
1 0
$a
Leeser, Miriam
$e
committee member
790
1 0
$a
Schirner, Gunar
$e
committee member
790
$a
0160
791
$a
M.S.
792
$a
2010
856
4 0
$u
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=1489297
based on 0 review(s)
Location:
ALL
電子資源
Year:
Volume Number:
Items
1 records • Pages 1 •
1
Inventory Number
Location Name
Item Class
Material type
Call number
Usage Class
Loan Status
No. of reservations
Opac note
Attachments
W9159199
電子資源
11.線上閱覽_V
電子書
EB
一般使用(Normal)
On shelf
0
1 records • Pages 1 •
1
Multimedia
Reviews
Add a review
and share your thoughts with other readers
Export
pickup library
Processing
...
Change password
Login