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Advances in CMP/polishing technologi...

Doi, Toshiro.

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Advances in CMP/polishing technologies for the manufacture of electronic devices

Record Type:	Electronic resources : Monograph/item
Title/Author:	Advances in CMP/polishing technologies for the manufacture of electronic devices/ edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.{me_controlnum}
other author:	Doi, Toshiro.
Published:	Oxford :William Andrew, : 2012.,
Description:	1 online resource (xii, 317 p.)
Notes:	Includes index.
Subject:	Electrolytic polishing. -
Online resource:	http://www.sciencedirect.com/science/book/9781437778595
ISBN:	9781437778595

Advances in CMP/polishing technologies for the manufacture of electronic devices
Advances in CMP/polishing technologies for the manufacture of electronic devices[electronic resource] /edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.{me_controlnum} - 1st ed. - Oxford :William Andrew,2012. - 1 online resource (xii, 317 p.)

Includes index.

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.

ISBN: 9781437778595Subjects--Topical Terms:

1613774
Electrolytic polishing.
Index Terms--Genre/Form:

542853
Electronic books.

LC Class. No.: TS670 / .A386 2012eb

Dewey Class. No.: 671.7/2

Advances in CMP/polishing technologies for the manufacture of electronic devices
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245 0 0 $a Advances in CMP/polishing technologies for the manufacture of electronic devices $h [electronic resource] / $c edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.{me_controlnum}
250 $a 1st ed.
260 $a Oxford : $b William Andrew, $c 2012.
300 $a 1 online resource (xii, 317 p.)
500 $a Includes index.
520 $a CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.
650 0 $a Electrolytic polishing. $3 1613774
650 0 $a Grinding and polishing. $3 1005779
655 4 $a Electronic books. $2 lcsh $3 542853
700 1 $a Doi, Toshiro. $4 edt $3 1613771
700 1 $a Marinescu, Ioan D. $4 edt $3 1613772
700 1 $a Kurokawa, Syuhei. $4 edt $3 1613773
856 4 0 $3 ScienceDirect $u http://www.sciencedirect.com/science/book/9781437778595
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