以雙光束干涉微影術製備電漿子晶體 = = Fabrication of...
黃立丞

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  • 以雙光束干涉微影術製備電漿子晶體 = = Fabrication of plasmonic crystal using two beam interference lithography /
  • Record Type: Language materials, printed : Monograph/item
    Title/Author: 以雙光束干涉微影術製備電漿子晶體 = / 黃立丞撰
    Reminder of title: Fabrication of plasmonic crystal using two beam interference lithography /
    remainder title: Fabrication of plasmonic crystal using two beam interference lithography
    Author: 黃立丞
    other author: 王智明
    Published: [花蓮縣壽豐鄉] : [國立東華大學光電工程學系], : 2012[民101],
    Description: 8,41面 : 圖,表 ; 30公分
    Notes: 校內電子全文開放日期 2015.7.27
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  • 1 records • Pages 1 •
 
GE0128731 五樓論文區 (5F Theses & Dissertations) 03.不外借_N 本校碩士論文 T 336 4401.1 2012 一般使用(Normal) On shelf 0
  • 1 records • Pages 1 •
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