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Manipulating Surfaces and Architectures in Block Copolymer Self-Assembly for Nanolithography and Thermoplastic Elastomers.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Manipulating Surfaces and Architectures in Block Copolymer Self-Assembly for Nanolithography and Thermoplastic Elastomers./
作者:	Bezik, Cody Thomas.
出版者:	Ann Arbor : ProQuest Dissertations & Theses, : 2021,
面頁冊數:	127 p.
附註:	Source: Dissertations Abstracts International, Volume: 83-01, Section: B.
Contained By:	Dissertations Abstracts International83-01B.
標題:	Chemistry. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=28412166
ISBN:	9798516958977

Manipulating Surfaces and Architectures in Block Copolymer Self-Assembly for Nanolithography and Thermoplastic Elastomers.
Bezik, Cody Thomas.

Manipulating Surfaces and Architectures in Block Copolymer Self-Assembly for Nanolithography and Thermoplastic Elastomers. - Ann Arbor : ProQuest Dissertations & Theses, 2021 - 127 p.

Source: Dissertations Abstracts International, Volume: 83-01, Section: B.

Thesis (Ph.D.)--The University of Chicago, 2021.

This item is not available from ProQuest Dissertations & Theses.

The self-assembly of classic diblock copolymers has been known to produce ordered mesophases at the nanoscale. Tailoring this self-assembly for engineering applications, however, requires more than relying on the natural behavior of these systems. The careful manipulation of the geometry and chemistry of surfaces can help guide diblock self-assembly into application relevant morphologies, leading to the potential for the use of block copolymers in nanolithography to produce semiconductor devices. Furthermore, the architecture of the polymer itself can be manipulated beyond the classic diblock to include multi-block and nonlinear motifs, leading to mesophases with larger domains and less regular structure. Such mesophases open the potential for extremely tough yet flexible thermoplastic elastomers. Using simulations, we probe key examples of these phenomena, including the use of diblock copolymers to pattern contact-hole morphologies for lithography and the critical influence of surface chemistry, the role of surface geometry and chemistry in determining the formation and annihilation of defects in line-and-space patterns for lithography, and the behavior of block copolymer thermoplastic elastomers formed from blends of star miktoarm copolymers and homopolymer assembled into the unique "bricks-and-mortar" mesophase.

ISBN: 9798516958977Subjects--Topical Terms:

516420
Chemistry.
Subjects--Index Terms:

Block copolymer

Manipulating Surfaces and Architectures in Block Copolymer Self-Assembly for Nanolithography and Thermoplastic Elastomers.
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245 1 0 $a Manipulating Surfaces and Architectures in Block Copolymer Self-Assembly for Nanolithography and Thermoplastic Elastomers.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 2021
300 $a 127 p.
500 $a Source: Dissertations Abstracts International, Volume: 83-01, Section: B.
500 $a Advisor: de Pablo, Juan.
502 $a Thesis (Ph.D.)--The University of Chicago, 2021.
506 $a This item is not available from ProQuest Dissertations & Theses.
506 $a This item must not be sold to any third party vendors.
520 $a The self-assembly of classic diblock copolymers has been known to produce ordered mesophases at the nanoscale. Tailoring this self-assembly for engineering applications, however, requires more than relying on the natural behavior of these systems. The careful manipulation of the geometry and chemistry of surfaces can help guide diblock self-assembly into application relevant morphologies, leading to the potential for the use of block copolymers in nanolithography to produce semiconductor devices. Furthermore, the architecture of the polymer itself can be manipulated beyond the classic diblock to include multi-block and nonlinear motifs, leading to mesophases with larger domains and less regular structure. Such mesophases open the potential for extremely tough yet flexible thermoplastic elastomers. Using simulations, we probe key examples of these phenomena, including the use of diblock copolymers to pattern contact-hole morphologies for lithography and the critical influence of surface chemistry, the role of surface geometry and chemistry in determining the formation and annihilation of defects in line-and-space patterns for lithography, and the behavior of block copolymer thermoplastic elastomers formed from blends of star miktoarm copolymers and homopolymer assembled into the unique "bricks-and-mortar" mesophase.
590 $a School code: 0330.
650 4 $a Chemistry. $3 516420
650 4 $a Engineering. $3 586835
650 4 $a Polymer chemistry. $3 3173488
650 4 $a Molecular physics. $3 3174737
650 4 $a Chemical engineering. $3 560457
650 4 $a Standard deviation. $3 3560390
650 4 $a Simulation. $3 644748
650 4 $a Copolymers. $3 1073457
650 4 $a Dissertations & theses. $3 3560115
650 4 $a Energy. $3 876794
650 4 $a Morphology. $3 591167
650 4 $a Interfaces. $2 gtt $3 834756
653 $a Block copolymer
653 $a Free energy sampling
653 $a Molecular dynamics
653 $a Monte carlo simulation
653 $a Nanolithography
653 $a Thermoplastic elastomer
690 $a 0485
690 $a 0537
690 $a 0495
690 $a 0542
690 $a 0609
690 $a 0287
690 $a 0791
710 2 $a The University of Chicago. $b Molecular Engineering. $3 3192669
773 0 $t Dissertations Abstracts International $g 83-01B.
790 $a 0330
791 $a Ph.D.
792 $a 2021
793 $a English
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