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Modification of semiconductor surfaces with organic molecules by wet-chemistry approaches.
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Modification of semiconductor surfaces with organic molecules by wet-chemistry approaches./
作者:
Tian, Fangyuan.
出版者:
Ann Arbor : ProQuest Dissertations & Theses, : 2013,
面頁冊數:
180 p.
附註:
Source: Dissertations Abstracts International, Volume: 75-10, Section: B.
Contained By:
Dissertations Abstracts International75-10B.
標題:
Chemistry. -
電子資源:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3613070
ISBN:
9781303751745
Modification of semiconductor surfaces with organic molecules by wet-chemistry approaches.
Tian, Fangyuan.
Modification of semiconductor surfaces with organic molecules by wet-chemistry approaches.
- Ann Arbor : ProQuest Dissertations & Theses, 2013 - 180 p.
Source: Dissertations Abstracts International, Volume: 75-10, Section: B.
Thesis (Ph.D.)--University of Delaware, 2013.
This item must not be sold to any third party vendors.
Modification of silicon-based material has been an interesting and practical research topic in modern technology for over the last couple of decades. With advanced chemical functionalization on silicon surfaces, new chemical reactivity, electronic and mechanical properties became available. The focus of chemical research leads toward targeting specific chemical bonds and functionalities on silicon, especially oxide-free silicon. This dissertation will mainly focus on modification of silicon surfaces with functional molecules, such as amino-terminated self-assembled monolayers, ammonia, fluorine-containing amines, and nitro-/nitroso- compounds. Besides, two major silicon cleaning methods used in industry are compared in this dissertation. Several surface analysis techniques are used for chemical interpretation, including infrared spectroscopy, X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectroscopy (ToF-SIMS). Surface morphology is examined by atomic force microscopy (AFM) and transmission electron microscopy (TEM). Besides, silicon surface electronic properties are investigated by measuring charge-carrier lifetime and surface recombination velocity. In addition, silicon cluster calculations are involved in this dissertation to optimize molecular structures, calculate transition states, and predict reaction pathways and vibrational frequencies based on density functional theory (DFT).
ISBN: 9781303751745Subjects--Topical Terms:
516420
Chemistry.
Subjects--Index Terms:
Dft cluster calculation
Modification of semiconductor surfaces with organic molecules by wet-chemistry approaches.
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Modification of silicon-based material has been an interesting and practical research topic in modern technology for over the last couple of decades. With advanced chemical functionalization on silicon surfaces, new chemical reactivity, electronic and mechanical properties became available. The focus of chemical research leads toward targeting specific chemical bonds and functionalities on silicon, especially oxide-free silicon. This dissertation will mainly focus on modification of silicon surfaces with functional molecules, such as amino-terminated self-assembled monolayers, ammonia, fluorine-containing amines, and nitro-/nitroso- compounds. Besides, two major silicon cleaning methods used in industry are compared in this dissertation. Several surface analysis techniques are used for chemical interpretation, including infrared spectroscopy, X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectroscopy (ToF-SIMS). Surface morphology is examined by atomic force microscopy (AFM) and transmission electron microscopy (TEM). Besides, silicon surface electronic properties are investigated by measuring charge-carrier lifetime and surface recombination velocity. In addition, silicon cluster calculations are involved in this dissertation to optimize molecular structures, calculate transition states, and predict reaction pathways and vibrational frequencies based on density functional theory (DFT).
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